Composition for formation of upper layer film, and method for formation of photoresist pattern

摘要

A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises
a resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), anda resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1).;
[In the general formulas (1-1) and (1-2), R1 is hydrogen or the like; R2 is single bonds or the like; and R3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.

主权项

1. A method for formation of photoresist pattern, comprising
a step of coating a photoresist composition on a substrate to form a photoresist film; a step of coating, on the photoresist film, a composition for formation of upper layer film to form an upper layer film; and a step of placing a liquid immersion medium between the upper layer film and a lens, applying an exposure ray to the photoresist film and the upper layer film via the liquid immersion medium and a mask having a particular pattern, then conducting development to obtain a resist pattern, wherein the composition for formation of upper layer film comprises:
a resin (A) having a repeating unit represented by a following general formula (1-1) and not having a repeating unit represented by a following general formula (1-2); anda resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1), wherein, in the above general formulas (1-1) and (1-2), R1 is a hydrogen atom, a methyl group or a trifluoromethyl group; R2 is a single bond, a methylene group, a linear or branched alkylene group having 2 to 6 carbon atoms, or a group represented by a general formula C(O)XR4, wherein X is an oxygen atom, a sulfur atom or an NH group and R4 is a methylene group, or a linear or branched alkylene group having 2 to 6 carbon atoms; and R3 is a linear or branched alkyl group of 1 to 12 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom, or an alkyl group of alicyclic structure, having 1 to 12 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom.