发明名称 LIQUID COMPOSITION, COPPER METAL FILM, CONDUCTIVE WIRING LINE, AND METHOD FOR PRODUCING COPPER METAL FILM
摘要 <p>Provided is a copper metal film which has less voids and good electrical conductivity, while exhibiting good adhesion to a base. A liquid composition which contains (a) at least one substance that is selected from the group consisting of formic acid and copper formate, (b) copper oxide particles and (c) a solvent.</p>
申请公布号 KR20140134305(A) 申请公布日期 2014.11.21
申请号 KR20147027080 申请日期 2013.02.20
申请人 FUJIFILM CORPORATION 发明人 YASUDA TAKAYASU
分类号 H01B1/22;C22B5/02;C23C18/14;H01B5/14;H01B13/00;H05K1/09 主分类号 H01B1/22
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