| 摘要 |
<p>PURPOSE: A chemical vapor depositing device is provided to maximize deposit efficiency by preventing floating and recycling of a source gas efficiently. CONSTITUTION: In a chemical vapor depositing device, a chamber(10) forms a space to perform a process of a substrate. A substrate support(20) is installed on the chamber and supports the substrate, and a shower head(30) sprays a first source gas on the substrate in a longitudinal direction. The injection nozzle(40) sprays the second source gas on a substrate in a traverse direction. A plurality of substrates are mounted on around the substrate support, and the injection nozzle is arranged at central part of the plurality of substrates.</p> |
