SUBSTRATE SURFACE TREATMENT METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a treatment method and a treatment device of substrate surface using a line-type particle beam source in which sputter particles scattering by surface treatment for one substrate do not affect the other substrate.SOLUTION: A substrate surface treatment method includes to perform beam irradiation for the surface of one substrate by using a line type particle beam source arranged between two substrates facing each other, and to prevent adhesion of a substance released from one substrate to the other substrate during beam irradiation by using a shielding member arranged between two substrates.