| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate for a mold, which prevents mismatch of pattern positions or generation of a pattern error when a pattern is produced on the substrate and the pattern is transferred, and which allows transfer of a complicated pattern with high precision.SOLUTION: A substrate for a mold for nanoimprinting comprises a circular quartz glass substrate having a diameter of 125 to 300 mm, on which a concavo-convex pattern is to be formed on a surface thereof, or comprises the above circular quartz glass substrate and a metal thin film or a resist film thereon for forming a transfer pattern. In the substrate, variance of thickness in a region within 125 mm diameter, where the concavo-convex pattern is formed, is 2μm or less. Within a circle having a diameter of 125 mm or smaller, a thickness T at a point t where the plate thickness is the maximum, a thickness C at the center c, and a thickness E at a point e, which is one of intersections between a straight line connecting the points t and c and the perimeter of the circle having a diameter of 125 mm or less and which is farther from the point t, are in a relation of T≥C≥E and satisfy the relationship expressed by 0.6μm≥T-E≥0.3μm.</p> |
