PATTERN FORMATION METHOD, ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION USED IN SAME, ELECTRONIC DEVICE USING SAME, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE

摘要

The purpose of the present invention is to provide a pattern formation method that makes it possible to form a pattern having a shape that exhibits suitable exposure latitude, suitable development characteristics, and a suitable pattern profile. This pattern formation method comprises: a step (A) in which a film is formed using an active ray-sensitive or radiation-sensitive resin composition that contains a compound that is represented by formula (A-1) and a resin that comprises a repeating unit that is represented by formula (nI) and that exhibits increased polarity and decreased solubility with respect to a liquid developer containing an organic solvent as a result of the action of an acid; a step (B) in which the film is irradiated with active rays or radiation; and a step (C) in which the film that has been irradiated with active rays or radiation is developed using the liquid developer that contains an organic solvent.