ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To facilitate detachment of a wafer in an electrostatic chuck that is used while being heated.SOLUTION: An electrostatic chuck includes a mounting table 20 formed of ceramics containing aluminum oxide and yttrium oxide, and an electrostatic electrode 22 arranged in the mounting table 20. The content rate of yttrium oxide is set in the range of 0.5-2.0 wt%.