发明名称 |
CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING ONE OR MORE POLYMERS SELECTED FROM THE GROUP CONSISTING OF N-VINYL-HOMOPOLYMERS AND N-VINYL COPOLYMERS |
摘要 |
Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of -15 mV or below at a pH in the range of from 2 to 6 (B) one or more polymers selected from the group consisting of N-vinyl-homopolymers and N- vinyl copolymers (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6. |
申请公布号 |
WO2014184702(A2) |
申请公布日期 |
2014.11.20 |
申请号 |
WO2014IB61200 |
申请日期 |
2014.05.05 |
申请人 |
BASF SE;BASF (CHINA) COMPANY LIMITED |
发明人 |
LAN, YONGQING;PRZYBYLSKI, PETER;BAO, ZHENYU;PRÖLSS, JULIAN |
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