PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of preventing a holding sheet from being subjected to an undesired effect when performing plasma processing.SOLUTION: The plasma processing apparatus includes: a chamber 11; a plasma source 13 that generates plasma in a chamber 11; a stage 16 provided in the chamber 11 on which a transfer carrier 5 is placed; a cover 31 which has a window 33 formed penetrating the cover 31 in a thickness direction in a central area thereof and is disposed above the stage 16 covering the holding sheet 6 and a frame 7; and a drive mechanism 38 that changes the relative position of the cover 31 with respect to the stage 16 between a first position separated away from the stage 16 allowing loading and unloading of the transfer carrier 5 with respect to the stage 16 and a second position where the cover 31 covers the holding sheet 6 and the frame 7 of the transfer carrier 5 loaded on the stage 16 and the window 33 exposes a substrate 2 held by the holding sheet 6. The window 33 of the cover 31 exposes an area of the substrate 2 inner than outer periphery of the substrate 2.