| 摘要 |
PROBLEM TO BE SOLVED: To provide a shape of a photomask opening with which the resist pattern of fine small rectangle shape can be formed as a photospacer. SOLUTION: A photospacer photomask is characterized in that a pattern in which an opening 8 of regular square shape rotated by 45 degrees with respect to a mask blank having a light shielding film 9 formed is adjacent at its corner or partially overlaps. The entire opening adjacent to the opening of the regular square shape lies in the range of (8 to 14)μm×(16 to 26)μm. COPYRIGHT: (C)2012,JPO&INPIT |
