发明名称 Meander line resistor structure
摘要 A meander line resistor structure comprises a first resistor formed on a first active region, wherein the first resistor is formed by a plurality of first vias connected in series, a second resistor formed on a second active region, wherein the second resistor is formed by a plurality of second vias connected in series and a third resistor formed on the second active region, wherein the third resistor is formed by a plurality of third vias connected in series. The meander line resistor further comprises a first connector coupled between the first resistor and the second resistor.
申请公布号 US8890222(B2) 申请公布日期 2014.11.18
申请号 US201213365303 申请日期 2012.02.03
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Yen Hsiao-Tsung;Lin Yu-Ling
分类号 H01L27/108;H01L29/8605 主分类号 H01L27/108
代理机构 Slater and Matsil, L.L.P. 代理人 Slater and Matsil, L.L.P.
主权项 1. An apparatus comprising: a substrate comprising a plurality of active regions; a first resistor formed over a first active region, wherein the first resistor includes a plurality of first vias connected in series and a bottom surface of the first resistor is in direct contact with a top surface of the first active region; a second resistor formed over a second active region, wherein the second resistor includes a plurality of second vias connected in series and a bottom surface of the second resistor is in direct contact with a top surface of the second active region, and wherein the first active region, the second active region and a gate stack form a transistor; a first connector coupled between the first resistor and the second resistor; and a third resistor formed over the second active region, wherein the third resistor includes a plurality of third vias connected in series.
地址 Hsin-Chu TW