发明名称 |
Meander line resistor structure |
摘要 |
A meander line resistor structure comprises a first resistor formed on a first active region, wherein the first resistor is formed by a plurality of first vias connected in series, a second resistor formed on a second active region, wherein the second resistor is formed by a plurality of second vias connected in series and a third resistor formed on the second active region, wherein the third resistor is formed by a plurality of third vias connected in series. The meander line resistor further comprises a first connector coupled between the first resistor and the second resistor. |
申请公布号 |
US8890222(B2) |
申请公布日期 |
2014.11.18 |
申请号 |
US201213365303 |
申请日期 |
2012.02.03 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Yen Hsiao-Tsung;Lin Yu-Ling |
分类号 |
H01L27/108;H01L29/8605 |
主分类号 |
H01L27/108 |
代理机构 |
Slater and Matsil, L.L.P. |
代理人 |
Slater and Matsil, L.L.P. |
主权项 |
1. An apparatus comprising:
a substrate comprising a plurality of active regions; a first resistor formed over a first active region, wherein the first resistor includes a plurality of first vias connected in series and a bottom surface of the first resistor is in direct contact with a top surface of the first active region; a second resistor formed over a second active region, wherein the second resistor includes a plurality of second vias connected in series and a bottom surface of the second resistor is in direct contact with a top surface of the second active region, and wherein the first active region, the second active region and a gate stack form a transistor; a first connector coupled between the first resistor and the second resistor; and a third resistor formed over the second active region, wherein the third resistor includes a plurality of third vias connected in series. |
地址 |
Hsin-Chu TW |