发明名称 Method for manufacturing wafer-bonded semiconductor device
摘要 The invention provides a wafer-bonded semiconductor device wherein warpage generated when wafers are bonded is reduced at a low cost ad through a simple process.;In a method for manufacturing a wafer-bonded semiconductor device by bonding a first wafer substrate and a second wafer substrate together, the method of the invention includes a first step of forming in advance bonding members having a bonding function when heated on the wafer-bonded surface sides of the first wafer substrate and the second wafer substrate, respectively; a second step of supplying flux paste containing two or more kinds of powdery materials having reactivity to the surfaces of the bonding members formed in the first step; and a third step of causing excitation to have the flux paste supplied in the second step start reacting.
申请公布号 US8889441(B2) 申请公布日期 2014.11.18
申请号 US201013519590 申请日期 2010.10.27
申请人 Hitachi, Ltd. 发明人 Takai Toshiaki;Sakigawa Yukio
分类号 H01L21/26;H01L31/18;H01L33/48;H01L21/50;H01L27/146;H01L23/10;H01L33/00;H01S5/42;H01L23/00;H01S5/022 主分类号 H01L21/26
代理机构 Antonelli, Terry, Stout & Kraus, LLP. 代理人 Antonelli, Terry, Stout & Kraus, LLP.
主权项 1. A method for manufacturing a wafer-bonded semiconductor device by bonding a first wafer substrate and a second wafer substrate together, comprising: a first step of forming in advance a bonding member having a bonding function when heated on the wafer-bonded surface sides of said first wafer substrate and said second wafer substrate; subsequent to forming the bonding member, a second step of supplying flux paste containing two or more kinds of powdery materials having reactivity to the surface of said bonding member formed in said first step; a third step of causing excitation for starting the reaction of said flux paste supplied in said second step; a fourth step of reacting the flux paste, the reaction of the flux paste being an exothermic reaction; and a fifth step of allowing the bonding member to exhibit its bonding function by heat generated by the exothermic reaction of the flux paste.
地址 Tokyo JP