发明名称 |
Electrode structure and method for forming bump |
摘要 |
An electrode structure 100 on which a solder bump is placed includes an electrode pattern 50 made of an electrode-constituting material selected from the group consisting of Cu, Al, Cr, and Ti, a Ni layer 52 formed on a part of the electrode pattern 50, a Pd layer 54 formed on at least a part of a region other than the part of the electrode pattern 50, and an Au layer 56 formed on the Ni layer 52 and the Pd layer 54. |
申请公布号 |
US8887383(B2) |
申请公布日期 |
2014.11.18 |
申请号 |
US200712518358 |
申请日期 |
2007.11.27 |
申请人 |
Panasonic Corporation |
发明人 |
Taniguchi Yasushi;Nakatani Seiichi;Kitae Takashi;Karashima Seiji;Hotehama Kenichi |
分类号 |
H01R9/00;H05K3/00;H05K3/34;H01L23/00;H05K3/24;H01L21/683 |
主分类号 |
H01R9/00 |
代理机构 |
Steptoe & Johnson LLP |
代理人 |
Steptoe & Johnson LLP |
主权项 |
1. A method for assembling electrically conductive bumps, on electrode patterns on a substrate having electrode patterns thereon, with an Ni layer on at least part of each of the electrode patterns, the method comprising:
(a) supplying onto the substrate and the electrode patterns a fluid containing conductive particles and a bubble generating agent; (b) placing a plate member on the fluid on the substrate and the electrode patterns; (c) heating the fluid thereby generating bubbles from the bubble generating agent, the bubbles then causing the conductive particles to collect selectively on each of the electrode patterns; and (d) melting the collected conductive particles and curing the melted conductive particles on the Ni layer on at least part of each of the electrode patterns. |
地址 |
Osaka JP |