发明名称 Electrode structure and method for forming bump
摘要 An electrode structure 100 on which a solder bump is placed includes an electrode pattern 50 made of an electrode-constituting material selected from the group consisting of Cu, Al, Cr, and Ti, a Ni layer 52 formed on a part of the electrode pattern 50, a Pd layer 54 formed on at least a part of a region other than the part of the electrode pattern 50, and an Au layer 56 formed on the Ni layer 52 and the Pd layer 54.
申请公布号 US8887383(B2) 申请公布日期 2014.11.18
申请号 US200712518358 申请日期 2007.11.27
申请人 Panasonic Corporation 发明人 Taniguchi Yasushi;Nakatani Seiichi;Kitae Takashi;Karashima Seiji;Hotehama Kenichi
分类号 H01R9/00;H05K3/00;H05K3/34;H01L23/00;H05K3/24;H01L21/683 主分类号 H01R9/00
代理机构 Steptoe & Johnson LLP 代理人 Steptoe & Johnson LLP
主权项 1. A method for assembling electrically conductive bumps, on electrode patterns on a substrate having electrode patterns thereon, with an Ni layer on at least part of each of the electrode patterns, the method comprising: (a) supplying onto the substrate and the electrode patterns a fluid containing conductive particles and a bubble generating agent; (b) placing a plate member on the fluid on the substrate and the electrode patterns; (c) heating the fluid thereby generating bubbles from the bubble generating agent, the bubbles then causing the conductive particles to collect selectively on each of the electrode patterns; and (d) melting the collected conductive particles and curing the melted conductive particles on the Ni layer on at least part of each of the electrode patterns.
地址 Osaka JP