Coating compositions

摘要

In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of the invention are useful for antireflective purposes, particularly with an underlaying photoresist coating layer, as well as for a barrier layer in immersion lithography.

主权项

1. A method for processing an electronic device substrate, comprising:
(a) applying a chemically-amplified positive photoresist layer on substrate; (b) applying above the photoresist layer an aqueous composition that comprises 1) hafnia or zirconia and 2) one or more resins distinct from hafnia or zirconia, wherein the aqueous composition has a solvent component that is at least 50 percent water; and (c) immersion exposing the photoresist layer with radiation having a wavelength of 193 nm.