发明名称 MASKING PATTERN FOR INERTIAL SENSOR AND INERTIAL SENSOR WHICH IS MANUFACTURED USING THE SAME
摘要 <p>A mask pattern for an inertia sensor according to the present invention includes: a membrane layer pattern having a connecting pattern to connect a frame pattern and a mass member pattern; and a mass member layer pattern having a frame pattern to form a frame and a mass member pattern to form a mass member, wherein the membrane layer pattern has a width and an area smaller than those of the mass member pattern.</p>
申请公布号 KR101461335(B1) 申请公布日期 2014.11.13
申请号 KR20130103023 申请日期 2013.08.29
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 KIM, JONG WOON;LEE, JAE CHANG;LIM, SEUNG MO
分类号 G01C19/56;G01C19/5769 主分类号 G01C19/56
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