发明名称 |
MASKING PATTERN FOR INERTIAL SENSOR AND INERTIAL SENSOR WHICH IS MANUFACTURED USING THE SAME |
摘要 |
<p>A mask pattern for an inertia sensor according to the present invention includes: a membrane layer pattern having a connecting pattern to connect a frame pattern and a mass member pattern; and a mass member layer pattern having a frame pattern to form a frame and a mass member pattern to form a mass member, wherein the membrane layer pattern has a width and an area smaller than those of the mass member pattern.</p> |
申请公布号 |
KR101461335(B1) |
申请公布日期 |
2014.11.13 |
申请号 |
KR20130103023 |
申请日期 |
2013.08.29 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
KIM, JONG WOON;LEE, JAE CHANG;LIM, SEUNG MO |
分类号 |
G01C19/56;G01C19/5769 |
主分类号 |
G01C19/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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