发明名称 LIQUID SUPPLY DEVICE, AND SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To suppress drying of a substrate, upon occurrence of serious failure in a substrate processing apparatus.SOLUTION: A pure water supply device 700 includes supply lines 712, 714 for supplying pure water to a substrate W, and valves 721-728 provided in the supply lines 712, 714 and capable of opening and closing the supply lines 712, 714. The pure water supply device 700 includes solenoid valves 772, 774, 776, 778 for opening and closing the supply lines 712, 714 by controlling the opening and closing of the valves 721-728. Furthermore, the pure water supply device 700 includes manual valves 754, 756, 758 capable of opening and closing the supply lines 712, 714 by controlling the opening and closing of the valves 721-728, when the power supply supplying the solenoid valves 772, 774, 776, 778 is lost.
申请公布号 JP2014212288(A) 申请公布日期 2014.11.13
申请号 JP20130089254 申请日期 2013.04.22
申请人 EBARA CORP 发明人 KOSUGE RYUICHI;UMEMOTO MASAO;NAKANO HISAJIRO;SONE CHUICHI
分类号 H01L21/304;B24B37/04 主分类号 H01L21/304
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