| 摘要 |
A method of forming a pattern comprises diffusing an acid formed by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer having acid decomposable groups and attachment groups covalently bonded to the surface of the substrate and/or forming an interpolymer crosslink. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region on the underlayer, with the shape of the pattern. The photosensitive layer is removed, forming a self-assembling layer comprising a block copolymer having a first block with an affinity for the polar region, and a second block having less affinity for the polar region. The first block forms a domain aligned to the polar region, and the second block forms another domain aligned to the first. Removing either domain exposes a portion of the underlayer. |
| 主权项 |
1. A underlayer comprising:
an acid sensitive copolymer of the formula:wherein R1 is a C1-30 acid decomposable group comprising a tertiary alkyl ester group, R3 is a C1-30 attachment group comprising a hydroxy group, R5 and R7 are independently a C1-30 functional group comprising an aromatic group or ester group, R2, R4, R6, and R8 are independently H or a C1-10 organic group, mole fractions w and x are 0.001 to 0.999, mole fractions y and z are 0 to 0.9, and the sum of mole fractions w, x, y, and z is 1.
wherein the acid sensitive copolymer is covalently bonded to a hydrophilic surface of a substrate through the attachment group by an alkoxide linkage, is crosslinked to form an interpolymer crosslink, or is both covalently bonded to the hydrophilic surface of the substrate and crosslinked to form an interpolymer crosslink, and wherein the acid decomposable groups are tertiary alkyl ester groups, acetal groups, ketal groups, carbonate groups, or a combination comprising at least one of the foregoing acid decomposable groups. |
