EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To suppress the leakage of liquid during the exchange of wafers in a liquid immersion exposure device.SOLUTION: An exposure device includes: a first stage WST1 that can move while mounting a substrate thereon within a predetermined area including a first area where a projection optical system PL is arranged and a second area different from the first area; a second stage WST2 that can move within the predetermined area; a linear motor system that moves the first and second stages respectively from one side to the other side in the first and second areas and moves the first and second stages independently within the predetermined area; a liquid immersion system that supplies a liquid immediately below the projection optical system to form a liquid immersion area; and a control system that moves the first and second stages below the projection optical system with the linear motor system while maintaining the liquid immersion area immediately below the projection optical system so that one of a fist state where the liquid immersion area is maintained between the projection optical system and the first stage and a second state where the liquid immersion area is maintained between the projection optical system and the second stage is shifted to the other.