METHOD AND APPARATUS FOR CLEANING DEPOSITION CHAMBER PARTS USING SELECTIVE SPRAY ETCH

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus of cleaning films from surfaces of a treating apparatus.SOLUTION: In one aspect, a method of cleaning an electronic device manufacturing process chamber part includes steps of: (a) spraying the part with an acid; (b) spraying the part with deionized water; and (c) treating the part with potassium hydroxide. In another embodiment, a spray type cleaning apparatus for components of an electronic device manufacturing process chamber includes: (a) a support member; (b) a spray nozzle mounted to the support member; (c) a cleaning chemical agent supply source; and (d) a conduit for conveying a cleaning chemical agent to the spray nozzle from the cleaning chemical agent supply source. The spray nozzle rotates and linearly moves, and the spray type cleaning apparatus directs the spray of the cleaning chemical agent to inside of the components of the electronic device manufacturing process chamber.