| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a vapor phase epitaxial growth device including a configuration for rotating a substrate holder by transmitting a rotation driving force from a substrate holder rotation driver, through a substrate holder rotation plate provided in the center of a reactor and having a gear on the outer periphery, to a plurality of substrate holders provided around the substrate holder rotation plate and having a gear on the outer periphery, which can rotate the substrate holder stably even in vapor phase epitaxial growth using a plurality of large substrates.SOLUTION: In a vapor phase epitaxial growth device, a substrate holder rotation plate has a configuration held rotatably for a base in the center via bearing balls.</p> |
