发明名称 Vertical power MOSFET and methods of forming the same
摘要 A device includes a semiconductor layer of a first conductivity type, and a first and a second body region over the semiconductor layer, wherein the first and the second body regions are of a second conductivity type opposite the first conductivity type. A doped semiconductor region of the first conductivity type is disposed between and contacting the first and the second body regions. A gate dielectric layer is disposed over the first and the second body regions and the doped semiconductor region. A first and a second gate electrode are disposed over the gate dielectric layer, and overlapping the first and the second body regions, respectively. The first and the second gate electrodes are physically separated from each other by a space, and are electrically interconnected. The space between the first and the second gate electrodes overlaps the doped semiconductor region.
申请公布号 US8884369(B2) 申请公布日期 2014.11.11
申请号 US201213486633 申请日期 2012.06.01
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Ng Chun-Wai;Chou Hsueh-Liang;Liu Ruey-Hsin;Su Po-Chih
分类号 H01L29/66 主分类号 H01L29/66
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A device comprising: a semiconductor layer of a first conductivity type; a first and a second body region over the semiconductor layer, wherein the first and the second body regions are of a second conductivity type opposite the first conductivity type; a doped semiconductor region of the first conductivity type between and contacting the first and the second body regions; a gate dielectric layer over the first and the second body regions and the doped semiconductor region; a first gate electrode over the gate dielectric layer, wherein the first gate electrode comprises a first edge, and wherein the first gate electrode overlaps the first body region; a second gate electrode over the gate dielectric layer and electrically coupled to the first gate electrode, wherein the second gate electrode overlaps the second body region, wherein the second gate electrode comprises a second edge separated from the first edge by a space, with no additional gate electrode disposed between the first edge and the second edge, and wherein the space overlaps the doped semiconductor region; and a source region comprising: first portions over the first and the second body regions; anda second portion disposed in the space.
地址 Hsin-Chu TW