Coherent multiple side electromagnets

摘要

In some embodiments, the present disclosure relates to a plasma processing system that generates a magnetic field having a maximum strength that is independent of workpiece size. The plasma processing system has a plurality of side electromagnets that have a size which is independent of the workpiece size. The side electromagnets are located around a perimeter of a processing chamber configured to house a semiconductor workpiece. When a current is provided to the side electromagnets, separate magnetic fields emanate from separate positions around the workpiece. The separate magnetic fields contribute to the formation of an overall magnetic field that controls the distribution of plasma within the processing chamber. Because the size of the plurality of separate side magnets is independent of the workpiece size, the plurality of side magnets can generate a magnetic field having a maximum field strength that is independent of workpiece size.

主权项

1. A plasma processing system, comprising:
a processing chamber configured to house a semiconductor workpiece; a plurality of side electromagnets positioned around a perimeter of the semiconductor workpiece and having sizes that are independent of a workpiece size; a power supply configured to pass current through the plurality of side electromagnets, which causes respective side electromagnets to generate separate magnetic fields that emanate from different positions around the semiconductor workpiece and that control distribution of a plasma within the processing chamber; and wherein said plurality of side electromagnets are oriented to have magnetic poles extending along an axis that is perpendicular to a radius of the semiconductor workpiece.