SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

A liquid film is formed on an upper side (91) of a substrate processing device (1) by using pure super-cooled liquid supplied to the upper side (91) of a substrate from a first liquid supply unit (31). A frozen film is formed by freezing the liquid film with cooled gas of a frozen unit (4). The temperature of the liquid film is lower than a pure freezing point and is to be easily frozen. When the liquid film is frozen by using the frozen unit (4), time which is necessary for the freezing of the liquid film is reduced. When the temperature of the cooled gas of the frozen unit (4) is increased in comparison to a state of forming a pure liquid film in the temperature which is higher than the freezing point, the liquid film is rapidly frozen. Insulation equipment such as a pipe which supplies the cooled gas to a cooled gas nozzle (41) from a cooled gas supply source is simplified. Therefore, freezing costs necessary for the freezing of the liquid film is decreased.