发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
摘要 <p>The invention relates to a photosensitive resin composition comprising a binder polymer having a (meth)acrylic acid-based structural unit, with a dispersity (weight-average molecular weight/number-average molecular weight) of no greater than 1.6, a photopolymerizable compound, a photopolymerization initiator and a sensitizing dye.</p>
申请公布号 KR20140130234(A) 申请公布日期 2014.11.07
申请号 KR20147028661 申请日期 2011.11.15
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 MIYASAKA MASAHIRO;ENDOU MASAKI;KUSHIDA MASATAKA;MURAMATSU YUKIKO;KAJI MAKOTO
分类号 G03F7/033;C08F2/50;C08F20/06;G03F7/004;G03F7/027;G03F7/029;H05K3/06 主分类号 G03F7/033
代理机构 代理人
主权项
地址