| 摘要 |
The invention relates to an optical element (50), comprising: a substrate (52), and a multilayer coating (51) applied to the substrate (52), comprising: at least one first layer system (53) consisting of an arrangement of identically constructed stacks (X1 to X4) each having at least two layers (53a-d), and at least one second layer system (54) consisting of an arrangement of identically constructed stacks (Y1, Y2) each having at least two layers (54a, 54b), wherein, upon a thermal loading of the multilayer coating (51), the first layer system (53) experiences an irreversible contraction of the thicknesses (d x) of the stacks (X1 to X4) and the second layer system (54) experiences an irreversible expansion of the thicknesses (dy) of the stacks (Y1, Y2). The invention also relates to an optical arrangement, in particular a lithography apparatus, comprising at least one such optical element (50). |
