SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of promptly adjusting a temperature of a process liquid in the middle of the substrate processing, and to provide a substrate processing method.SOLUTION: A substrate processing apparatus 1 according to one embodiment comprises: a support part 4 which supports a substrate W; a rotary mechanism 5 which rotates the support part 4 using a shaft, which intersects with the substrate W supported by the support part 4, as a rotation shaft; a nozzle 6 which supplies a process liquid to a surface of the substrate W on the support part 4 rotated by the rotary mechanism 5; a heater 8 which heats the substrate W supported by the support part 4 while being separated from the substrate W; and a movement mechanism 9 which moves the heater 8 toward and away from the substrate W supported by the support part 4.