CYLINDRICAL SPUTTERING TARGET AND MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a cylindrical sputtering target formed of a Cu-Ga alloy capable of reducing cracks, and to provide a manufacturing method thereof, concerning a Cu-Ga alloy sputtering target used for deposition of a light absorption layer of a compound semiconductor.SOLUTION: A cylindrical sputtering target is formed of casting using a Cu alloy containing Ga as much as 15-35 atom% in which the mean value of ratios of each major axis and each minor axis of crystal grains in the Cu alloy is 2.0 or less.