| 发明名称 |
METHOD FOR PRODUCING METAL OXIDE FILM AND METAL OXIDE FILM |
| 摘要 |
<p>In the method for producing a metal oxide film according to the present invention, a solution containing an alkyl metal is sprayed onto a substrate placed under non-vacuum. Further, when the solution is sprayed, a dopant solution containing a dopant including an inorganic compound is sprayed onto the substrate.</p> |
| 申请公布号 |
KR20140129197(A) |
申请公布日期 |
2014.11.06 |
| 申请号 |
KR20147025959 |
申请日期 |
2012.03.28 |
| 申请人 |
TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION |
发明人 |
SHIRAHATA TAKAHIRO;ORITA HIROYUKI;HIRAMATSU TAKAHIRO |
| 分类号 |
C23C26/00;C01B13/08;C01F5/02;C01G9/02;C01G11/00 |
主分类号 |
C23C26/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
