| 摘要 |
PROBLEM TO BE SOLVED: To obtain an optical element for an exposure filter, in which an inorganic birefringent material with high ultraviolet ray transmittance and high ultraviolet ray resistance is used and on which a highly precise and arbitrary pattern is formed. SOLUTION: An anisotropic photosensitive layer is formed into a photo-alignment layer of which the anisotropy of the section corresponding to a first pattern and that of the section corresponding to other regions are different from each other by: making a polarized light beam emitted from a light source and having a plane of polarization forming an angle with an anisotropic optic axis of a birefringent layer pass through the optical element having a first pattern and the other regions formed thereon with a constant phase difference between each other caused by the birefringent layer joined to a surface of a transparent base material and composed of an inorganic material; changing the polarized light beam into polarized light beams with their plane of polarization rotated to directions different between the first pattern and the other regions of the birefringent layer; and exposing the birefringent layer to the polarized light beam. COPYRIGHT: (C)2009,JPO&INPIT |
