发明名称 Graphene growth on a non-hexagonal lattice
摘要 A graphene layer is formed on a crystallographic surface having a non-hexagonal symmetry. The crystallographic surface can be a surface of a single crystalline semiconductor carbide layer. The non-hexagonal symmetry surface of the single crystalline semiconductor carbide layer is annealed at an elevated temperature in ultra-high vacuum environment to form the graphene layer. During the anneal, the semiconductor atoms on the non-hexagonal surface of the single crystalline semiconductor carbide layer are evaporated selective to the carbon atoms. As the semiconductor atoms are selectively removed, the carbon concentration on the surface of the semiconductor-carbon alloy layer increases. Despite the non-hexagonal symmetry of the surface of the semiconductor-carbon alloy layer, the remaining carbon atoms can coalesce to form a graphene layer having hexagonal symmetry.
申请公布号 US8877340(B2) 申请公布日期 2014.11.04
申请号 US201012844029 申请日期 2010.07.27
申请人 International Business Machines Corporation 发明人 Chu Jack O.;Dimitrakopoulos Christos;Freitag Marcus O.;Grill Alfred;McArdle Timothy J.;Sung Chun-Yung;Wisnieff Robert L.
分类号 B32B9/00 主分类号 B32B9/00
代理机构 Scully, Scott, Murphy & Presser, P.C. 代理人 Scully, Scott, Murphy & Presser, P.C. ;Percello, Esq. Louis J.
主权项 1. A method of forming a graphene layer including at least one graphene monolayer, said method comprising forming a graphene layer by evaporating semiconductor atoms selective to carbon atoms from a crystallographic semiconductor surface having a non-hexagonal symmetry that is different from a symmetry of a (111) plane of any cubic crystal structure.
地址 Armonk NY US