Method of manufacturing organic light emitting display device

摘要

An organic light emitting display device is manufactured by: preparing a target substrate that includes sub-pixel areas (each having a thin film transistor) and pixel defining areas (each having a conductive layer) between the sub-pixel areas; preparing an ionized deposition material by vaporizing and ionizing a deposition material; applying a ground voltage to one of the sub-pixel areas while applying a voltage having a same polarity as the ionized deposition material to the neighboring ones of the sub-pixel areas and to the pixel defining areas; and depositing the ionized deposition material on the one of the sub-pixel areas to form an organic thin layer while the one of the sub-pixel areas is polarized by an electric field generated by the voltage being applied to the conductive layer of the pixel defining areas.

主权项

1. A method of manufacturing an organic light emitting display device, comprising:
preparing a target substrate that comprises:
a plurality of sub-pixel areas each comprising
a thin film transistor comprising a gate electrode,a first wiring electrically connected to the gate electrode, anda pixel electrode connected to the thin film transistor; anda plurality of pixel defining areas between the sub-pixel areas, each comprising
a pixel definition layer,a conductive layer on the pixel definition layer, anda second wiring electrically connected to the conductive layer; preparing an ionized deposition material by vaporizing and ionizing a deposition material; applying a ground voltage to the first wiring of one of the sub-pixel areas while applying a voltage having a same polarity as the ionized deposition material to the first wiring of neighboring ones of the sub-pixel areas and to the second wiring of the pixel defining areas; and depositing the ionized deposition material on the pixel electrode of the one of the sub-pixel areas to form an organic thin layer while the pixel electrode of the one of the sub-pixel areas is polarized by an electric field generated by the voltage being applied to the conductive layer of the pixel defining areas, wherein the depositing of the ionized deposition material comprises:
depositing a first portion of the ionized deposition material on a center area of the pixel electrode of the one of the sub-pixel areas by using a repulsive force acting between the ionized deposition material and the conductive layer;depositing a second portion of the ionized deposition material on an area between the deposited first portion and an edge area of the pixel electrode of the one of the sub-pixel areas by using the repulsive force acting between the ionized deposition material and the conductive layer, and a repulsive force acting between the ionized deposition material and the deposited first portion; anddepositing a third portion of the ionized deposition material on an area between the deposited second portion and the edge area of the pixel electrode of the one of the sub-pixel areas, and on an area between the deposited first portion and the deposited second portion using repulsive forces acting between the ionized deposition material and the deposited first portion, the deposited second portion, and the conductive layer.