| 主权项 |
1. A positive resist composition comprising:
(A) a resin capable of increasing the solubility in an alkali developing solution by the action of an acid, comprising: (a1) a repeating unit represented by the following formula (a1-3); (a2) a repeating unit represented by a following formula (a2); and (a3) a repeating unit selected from repeating units represented by following formulae (a3-1) to (a3-4); (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom, said resin being stable to an acid, not containing a group increasing in solubility in an alkali developing solution, and being insoluble in an alkali developing solution; and (D) a solvent: wherein R represents a hydrogen atom, a halogen atom, or an alkyl group; R′ represents a group capable of leaving by the action of an acid; each of R12 and R13 independently represents a hydrogen atom, a methyl group, an ethyl group, or a propyl group; R14 represents an alicyclic group; and n represents an integer of from 0 to 5. |
