| 发明名称 | Antimicrobial photo-stable coating composition | ||
| 摘要 | The invention is an antimicrobial photo-stable coating composition that deters photo-induced discoloration, does not stain tissue and can be applied to the surface of a variety of medical materials. The composition comprises in an aspect silver-PCA complex and dye. | ||
| 申请公布号 | US8877256(B2) | 申请公布日期 | 2014.11.04 |
| 申请号 | US200812183426 | 申请日期 | 2008.07.31 |
| 申请人 | Covalon Technologies Ltd. | 发明人 | Dudnik Vyacheslav;Natali Yakeemovich;DiTizio Valerio;DiCosmo Frank |
| 分类号 | A61K33/38;A61K31/555;A61L31/10;A61L15/18;A01N25/34;A61K31/785;A01N59/16;A61L15/46;A61L27/30;A61L27/54;A61L29/10;A61L29/16;A61L31/08;A61L31/16;C08J7/06;C08J7/18;C09D5/14 | 主分类号 | A61K33/38 |
| 代理机构 | Knobbe Martens Olson & Bear LLP | 代理人 | Knobbe Martens Olson & Bear LLP |
| 主权项 | 1. An antimicrobial photo-stable coating composition comprising complexed silver and dye, wherein said complexed silver comprises silver salt complexed to a molecule with a basic nitrogen atom to protect said silver from subsequent oxidation/reduction reactions, wherein said molecule is selected from the group consisting of ammonia, glycine, glutamic acid, tris(hydroxymethyl)aminomethane, polyethyleneimine, pyrrolidone carboxylic acid (PCA) and mixtures thereof, and wherein said dye absorbs light in the wavelength range of about 550-680 nm and about 380-450 nm and thereby deters photo-induced discoloration, and wherein said composition does not substantially stain tissue and can be applied to the surface of a variety of medical materials. | ||
| 地址 | Ontario CA | ||