METHOD FOR PRODUCING SPUTTERING TARGET MATERIAL FOR NI-W BASED INTERLAYER

摘要

THERE IS PROVIDED A METHOD FOR PRODUCING SPUTTERING TARGET MATERIALS WHICH ARE USED FOR A NI-W BASED INTERLAYER IN A PERPENDICULAR MAGNETIC RECORDING MEDIUM. IN THIS PRODUCING METHOD, A NI-W BASED ALLOY POWDER IS PREPARED AS A RAW MATERIAL POWDER. THE ALLOY POWDER COMPRISES 5 TO 20 AT% OF W AND THE BALANCE NI AND UNAVOIDABLE IMPURITIES AND IS PRODUCED BY GAS ATOMIZATION. THE RAW MATERIAL POWDER IS CONSOLIDATED AT A TEMPERATURE RANGING FROM 900 TO 1150 °C. THIS PRODUCING METHOD MAKES IT POSSIBLE TO SIGNIFICANTLY RESTRAIN EXPANSION OF THE POWDER-FILLED BILLET IN THE CONSOLIDATION STEP, THUS EFFICIENTLY PRODUCING NI-W BASED SPUTTERING TARGET MATERIALS WITH STABLE QUALITIES.