APPARATUS AND METHOD FOR SOLUTION TRANSFER-TYPE IMPRINT LITHOGRAPHY USING ROLL STAMP

摘要

The present invention relates to an apparatus and a method for solution transfer-type imprint lithography using a roll stamp and, more particularly, to an apparatus and a method for guaranteeing that, in the process of transferring a resist, which has been applied on a first substrate, to a roll stamp and then retransferring the resist to a second substrate, the surface pattern of the roll stamp is replicated to the resist that has been transferred on the second substrate.