IMPRINT MOLD AND DUMMY PATTERN DESIGNING METHOD

摘要

This imprint mold has, in a pattern region on the main surface of a base, a main pattern comprising a recessed and projected structure and a dummy pattern comprising a recessed and projected structure for assisting transfer of the main pattern. At least one end portion of the recessed structure or the projected structure of the dummy pattern reaches the outermost periphery of the pattern region, and no closed region that is surrounded by the recessed structure or the projected structure of one or more dummy patterns is within the pattern region when this imprint mold is viewed in plan.