| 发明名称 |
METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD |
| 摘要 |
A method of manufacturing a liquid discharge head is provided. The method includes forming a heating element on a substrate in which a semiconductor element is arranged. The method further includes forming a protection layer to contact an upper surface of the heating element. Annealing is performed in a hydrogen-containing atmosphere before the step of forming the protection layer. |
| 申请公布号 |
US2014322835(A1) |
申请公布日期 |
2014.10.30 |
| 申请号 |
US201414247445 |
申请日期 |
2014.04.08 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Yoshikawa Masao;Sasaki Keiichi;Yasuda Takeru |
| 分类号 |
B41J2/16 |
主分类号 |
B41J2/16 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacturing a liquid discharge head, comprising:
forming a heating element on a substrate in which a semiconductor element is arranged; and forming a protection layer being in contact with an upper surface of the heating element, wherein annealing is performed in a hydrogen-containing atmosphere before the step of forming the protection layer. |
| 地址 |
Tokyo JP |
