发明名称 MAGNETORESISTANCE EFFECT ELEMENT, MAGNETIC FILM, AND METHOD FOR MANUFACTURING MAGNETIC FILM
摘要 PROBLEM TO BE SOLVED: To provide a magnetoresistance element where a magnetization direction is stable in a direction perpendicular to a film surface and magnetoresistance change ratio is controlled, and to provide a magnetic memory using the magnetoresistance element, a magnetic film, a method for manufacturing the magnetic film.SOLUTION: A material for a ferromagnetic layer constituting a magnetoresistance element is configured with a ferromagnetic material that contains at least one kind of 3d transition metal, thereby, magnetoresistance change ratio is controlled. A magnetization direction is changed from a film in-plane direction to a direction perpendicular to a film surface by controlling film thickness of the ferromagnetic layer at an atomic layer level.
申请公布号 JP2014207469(A) 申请公布日期 2014.10.30
申请号 JP20140125474 申请日期 2014.06.18
申请人 TOHOKU UNIV;HITACHI LTD 发明人 ONO HIDEO;IKEDA SHOJI;MATSUKURA FUMIHIRO;ENDO MASAKI;KANAI SHUN;MIURA KATSUYA;YAMAMOTO HIROYUKI
分类号 H01L43/08;H01F10/16;H01F10/30;H01F10/32;H01L21/8246;H01L27/105;H01L29/82;H01L43/10;H01L43/12 主分类号 H01L43/08
代理机构 代理人
主权项
地址