发明名称 FILM DEPOSITION APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a film deposition apparatus which allows easily adjusting magnetic force of a ring hearth.SOLUTION: A film deposition apparatus 1 includes a nonmagnetic housing body 23 which has multiple first through-holes 27, and magnets 24 which are disposed in the first through-holes 27. Among the multiple first through-holes 27, the magnets 24 are disposed in some of the first through-holes 27, and the magnets 24 are not disposed but voids are formed in the other first through-hoes 27. Therefore, when magnetic force of a permanent magnetic part 20 in a ring hearth 6 is adjusted, magnetic force can easily be weakened by removing the magnets 24 disposed in some of the first through-holes 27, and the magnetic force can easily be strengthened by disposing the magnets 24 in the other first through-holes 27 which are the voids 29. This allows easily adjusting the magnetic force of the ring hearth 6.</p>
申请公布号 JP2014205873(A) 申请公布日期 2014.10.30
申请号 JP20130083020 申请日期 2013.04.11
申请人 SUMITOMO HEAVY IND LTD 发明人 SAKAMI TOSHIYUKI
分类号 C23C14/32;H01L21/31 主分类号 C23C14/32
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