发明名称 |
ELECTRON GUN, CHARGED PARTICLE GUN, AND CHARGED PARTICLE BEAM APPARATUS USING ELECTRON GUN AND CHARGED PARTICLE GUN |
摘要 |
The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode. |
申请公布号 |
WO2014175087(A1) |
申请公布日期 |
2014.10.30 |
申请号 |
WO2014JP60575 |
申请日期 |
2014.04.14 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
IMAI YUTA;OHSHIMA TAKASHI;MORISHITA HIDEO |
分类号 |
H01J37/073;H01J27/26;H01J37/06;H01J37/063;H01J37/08;H01J37/28 |
主分类号 |
H01J37/073 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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