| 摘要 |
<p>An in-line heat treatment apparatus is disclosed. In the in-line heat treatment apparatus according to the present invention, a substrate is transported by being mounted and supported on a moving member which moves in the same direction as or the opposite direction to a substrate transporting direction. Therefore, frictional force does not act between the substrate and the moving member or between a support member on which the substrate is mounted and supported and the moving member and no particles are generated. As a result, damage to the substrate due to particles is prevented, thereby improving the reliability of a product.</p> |
