发明名称 |
Method of forming metal pattern and method of manufacturing display substrate having the same |
摘要 |
A method of forming a metal pattern includes forming a precursor layer including a metal precursor on a substrate, irradiating a light on the precursor layer to form a metal seed layer having a predetermined pattern, and electroless-plating the metal seed layer to form a metal pattern layer. |
申请公布号 |
US8871075(B2) |
申请公布日期 |
2014.10.28 |
申请号 |
US201213405532 |
申请日期 |
2012.02.27 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Byeon Jeong-Hoon;Yeo In-Seok;Chang Jae-Hyuk;Lee Seung-Jun;Kim Hyun-Seok;Lee Sung-Hee |
分类号 |
C25D5/02 |
主分类号 |
C25D5/02 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP |
主权项 |
1. A method of forming a metal pattern, the method comprising:
forming a precursor layer including a metal precursor, on a substrate; irradiating a light on the precursor layer to form a metal seed layer comprising a plurality of discrete patterns arranged in a predetermined pattern on the substrate, comprising:
a light source irradiating the light in the predetermined pattern on the precursor layer to expose and reduce the precursor layer; andthe same light source annealing the reduced precursor layer by the light; and electroless-plating the metal seed layer discrete patterns to form a metal pattern layer comprising a plurality of discrete patterns each formed from a group of the metal seed layer discrete patterns. |
地址 |
KR |