发明名称 Method of forming metal pattern and method of manufacturing display substrate having the same
摘要 A method of forming a metal pattern includes forming a precursor layer including a metal precursor on a substrate, irradiating a light on the precursor layer to form a metal seed layer having a predetermined pattern, and electroless-plating the metal seed layer to form a metal pattern layer.
申请公布号 US8871075(B2) 申请公布日期 2014.10.28
申请号 US201213405532 申请日期 2012.02.27
申请人 Samsung Display Co., Ltd. 发明人 Byeon Jeong-Hoon;Yeo In-Seok;Chang Jae-Hyuk;Lee Seung-Jun;Kim Hyun-Seok;Lee Sung-Hee
分类号 C25D5/02 主分类号 C25D5/02
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. A method of forming a metal pattern, the method comprising: forming a precursor layer including a metal precursor, on a substrate; irradiating a light on the precursor layer to form a metal seed layer comprising a plurality of discrete patterns arranged in a predetermined pattern on the substrate, comprising: a light source irradiating the light in the predetermined pattern on the precursor layer to expose and reduce the precursor layer; andthe same light source annealing the reduced precursor layer by the light; and electroless-plating the metal seed layer discrete patterns to form a metal pattern layer comprising a plurality of discrete patterns each formed from a group of the metal seed layer discrete patterns.
地址 KR