Process for removing carbon material from substrates

摘要

A method of removing carbon materials, preferably amorphous carbon, from a substrate includes dispensing a liquid sulfuric acid composition including sulfuric acid and/or its desiccating species and precursors and having a water/sulfuric acid molar ratio of no greater than 5:1 onto an material coated substrate in an amount effective to substantially uniformly coat the carbon material coated substrate. The liquid sulfuric acid composition is exposed to water vapor in an amount effective to increase the temperature of the liquid sulfuric acid composition above the temperature of the liquid sulfuric acid composition prior to exposure to the water vapor. In preferred embodiments, amorphous carbon is selectively removed as compared to a silicon oxide (e.g., silicon dioxide) and/or silicon nitride.

主权项

1. A method of removing carbon material from a semiconductor substrate, comprising:
providing a semiconductor substrate in a treatment chamber, wherein the semiconductor substrate has a carbon film on at least a portion of a surface thereof, wherein the carbon film comprises a material selected from the group consisting of amorphous carbon, diamond-like carbon, and graphitic carbon; dispensing a liquid sulfuric acid composition from a first supply line comprising sulfuric acid and/or its desiccating species and precursors onto the substrate surface in an amount effective to substantially uniformly coat the substrate surface; and exposing the liquid sulfuric acid composition on the substrate surface to water vapor which is dispensed from a second supply line and in an amount effective to increase the temperature of the liquid sulfuric acid composition above the temperature of the liquid sulfuric acid composition prior to exposure to the water vapor, wherein the liquid sulfuric acid composition is at a temperature of at least 130° C. and less than 220° C. prior to exposure to the water vapor; and wherein the liquid sulfuric acid composition on the substrate surface is exposed to the water vapor for a time period to remove at least a portion of the carbon film from the surface.