POLISHING LIQUID FOR CMP, STORED LIQUID, AND POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polishing liquid for CMP that is capable of smoothly polishing an aluminum-based material at a satisfactory polishing speed and has excellent storage stability.SOLUTION: A polishing liquid for CMP is for polishing a substrate containing an aluminum-based material. The polishing liquid for CMP contains abrasive grains; at least one kind of benzotriazole compound selected from the group consisting of benzotriazole and a derivative thereof; oxidant; at least one kind selected from the group consisting of diethylenetriamine pentaacetic acid and a salt thereof; and a liquid medium.