发明名称 |
VAPOR SOURCE, VACUUM VAPOR DEPOSITION APPARATUS AND METHOD OF PRODUCING ORGANIC EL DISPLAY APPARATUS |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a vapor source and a vacuum vapor deposition apparatus which form, at high speed, a metal thin film for an organic EL upper electrode having a uniform film thickness on a large substrate, reduce vapor leakage and temperature decrease of a nozzle and allows long-time continuous operation.SOLUTION: A nozzle 3-4a has a sleeve part 22 which comes in contact with an inner wall so as to be a nest in the inner wall of a crucible 3-2a and a nozzle part provided with a beak-like nozzle hole 3-5a protruding from the tip of the sleeve part 22. At least the sleeve part 22 of the nozzle 3-4a is composed of a material having a thermal expansion coefficient comparable with or a little larger than that of the material of the crucible. The nozzle 3-4a present inside the crucible 3-2a expands to the crucible 3-2a when the temperature of the vapor source is raised in vapor deposition, preventing vapor leakage.</p> |
申请公布号 |
JP2014198863(A) |
申请公布日期 |
2014.10.23 |
申请号 |
JP20130074060 |
申请日期 |
2013.03.29 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
MIYAKE TATSUYA;MATSUURA HIROYASU;MINEKAWA HIDEAKI;OGATA TOMOHIKO;YAMAMOTO KENICHI;KUSUNOKI TOSHIAKI;TAMAKOSHI TAKESHI |
分类号 |
C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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