发明名称 SCHOTTKY BARRIER DIODES WITH A GUARD RING FORMED BY SELECTIVE EPITAXY
摘要 Schottky barrier diodes, methods for fabricating Schottky barrier diodes, and design structures for a Schottky barrier diode. A guard ring for a Schottky barrier diode is formed with a selective epitaxial growth process. The guard ring for the Schottky barrier diode and an extrinsic base of a vertical bipolar junction diode on a different device region than the Schottky barrier diode may be concurrently formed using the same selective epitaxial growth process.
申请公布号 US2014312453(A1) 申请公布日期 2014.10.23
申请号 US201414323502 申请日期 2014.07.03
申请人 International Business Machines Corporation 发明人 Harame David L.;Liu Qizhi;Rassel Robert M.
分类号 H01L29/872;H01L29/06 主分类号 H01L29/872
代理机构 代理人
主权项 1. A device structure comprising: a device region comprised of a first semiconductor material and having a top surface; a Schottky barrier diode having an anode on the top surface of the device region, a cathode in the device region, and a Schottky junction defined between the anode and the cathode; and a guard ring for the Schottky barrier diode, the guard ring is comprised of a second semiconductor material having an epitaxial relationship with the first semiconductor material.
地址 Armonk NY US