发明名称 |
SCHOTTKY BARRIER DIODES WITH A GUARD RING FORMED BY SELECTIVE EPITAXY |
摘要 |
Schottky barrier diodes, methods for fabricating Schottky barrier diodes, and design structures for a Schottky barrier diode. A guard ring for a Schottky barrier diode is formed with a selective epitaxial growth process. The guard ring for the Schottky barrier diode and an extrinsic base of a vertical bipolar junction diode on a different device region than the Schottky barrier diode may be concurrently formed using the same selective epitaxial growth process. |
申请公布号 |
US2014312453(A1) |
申请公布日期 |
2014.10.23 |
申请号 |
US201414323502 |
申请日期 |
2014.07.03 |
申请人 |
International Business Machines Corporation |
发明人 |
Harame David L.;Liu Qizhi;Rassel Robert M. |
分类号 |
H01L29/872;H01L29/06 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
1. A device structure comprising:
a device region comprised of a first semiconductor material and having a top surface; a Schottky barrier diode having an anode on the top surface of the device region, a cathode in the device region, and a Schottky junction defined between the anode and the cathode; and a guard ring for the Schottky barrier diode, the guard ring is comprised of a second semiconductor material having an epitaxial relationship with the first semiconductor material. |
地址 |
Armonk NY US |