IMPRINT LITHOGRAPHY EQUIPMENT WITH SELF-ALIGNMENT FUNCTION OF CONTACTING SURFACE AND METHOD OF IMPRINTING LITHOGRAPHY FOR USING THE SAME

摘要

The present invention relates to a self-alignment imprint lithography apparatus and an imprint lithography method using the same. More particularly, the present invention relates to a self-alignment imprint lithography apparatus which arranges the position of a substrate in parallel to the contact surface of a stamp to apply a force to the entire region of the substrate with uniform pressure distribution when the stamp is in contact with the substrate fixed by a substrate chuck in an imprint lithography process, and an imprint lithography method using the same.