发明名称 |
Semiconductor structure for an electrostatic discharge protection circuit |
摘要 |
An embodiment of a semiconductor structure for an electrostatic discharge (“ESD”) protection circuit is disclosed. For this embodiment, there is a substrate of a first polarity type. A device area of the substrate has a source region and a drain region of a transistor. The device area is of the first polarity type, and the source region and the drain region are each of a second polarity type. A well region of the second polarity type surrounds the device area. An outer tap of the first polarity type surrounds the well region, and a bridge interconnects the source region and the outer tap. |
申请公布号 |
US8866229(B1) |
申请公布日期 |
2014.10.21 |
申请号 |
US201113245162 |
申请日期 |
2011.09.26 |
申请人 |
Xilinx, Inc. |
发明人 |
Fakhruddin Mohammed;Karp James |
分类号 |
H01L23/62 |
主分类号 |
H01L23/62 |
代理机构 |
|
代理人 |
Webostad W. Eric |
主权项 |
1. A semiconductor structure for an electrostatic discharge (“ESD”) protection circuit, comprising:
a substrate of a first polarity type; a device area of the substrate having a source region and a drain region of a transistor; wherein the device area is of the first polarity type; wherein the source region and the drain region are each of a second polarity type; a well region of the second polarity type surrounding the device area; an outer tap of the first polarity type surrounding the well region; anda bridge interconnecting the source region and the outer tap. |
地址 |
San Jose CA US |