发明名称 Semiconductor structure for an electrostatic discharge protection circuit
摘要 An embodiment of a semiconductor structure for an electrostatic discharge (“ESD”) protection circuit is disclosed. For this embodiment, there is a substrate of a first polarity type. A device area of the substrate has a source region and a drain region of a transistor. The device area is of the first polarity type, and the source region and the drain region are each of a second polarity type. A well region of the second polarity type surrounds the device area. An outer tap of the first polarity type surrounds the well region, and a bridge interconnects the source region and the outer tap.
申请公布号 US8866229(B1) 申请公布日期 2014.10.21
申请号 US201113245162 申请日期 2011.09.26
申请人 Xilinx, Inc. 发明人 Fakhruddin Mohammed;Karp James
分类号 H01L23/62 主分类号 H01L23/62
代理机构 代理人 Webostad W. Eric
主权项 1. A semiconductor structure for an electrostatic discharge (“ESD”) protection circuit, comprising: a substrate of a first polarity type; a device area of the substrate having a source region and a drain region of a transistor; wherein the device area is of the first polarity type; wherein the source region and the drain region are each of a second polarity type; a well region of the second polarity type surrounding the device area; an outer tap of the first polarity type surrounding the well region; anda bridge interconnecting the source region and the outer tap.
地址 San Jose CA US