| 发明名称 | Control apparatus, a substrate treating method, a substrate treating system, a method of operating a substrate treating system, a load port control apparatus, and a substrate treating system having the load port control apparatus | ||
| 摘要 | A control apparatus in a substrate treating system with a substrate treating apparatus having a physical load port for receiving pods for storing substrates, and a carrier transport system for transporting the pods to and from the physical load port. The control apparatus includes a virtual load port control device for allotting a virtual load port to the physical load port, and instructing the carrier transport system to perform a transporting operation to and from the virtual load port on an assumption that the virtual load port really exists. | ||
| 申请公布号 | US8868233(B2) | 申请公布日期 | 2014.10.21 |
| 申请号 | US201213541345 | 申请日期 | 2012.07.03 |
| 申请人 | Dainippon Screen Mfg. Co., Ltd. | 发明人 | Shibata Hideki |
| 分类号 | G06F7/00;H01L21/67;H01L21/677;G05B19/418 | 主分类号 | G06F7/00 |
| 代理机构 | Ostrolenk Faber LLP | 代理人 | Ostrolenk Faber LLP |
| 主权项 | 1. A control apparatus for a substrate treating system, the substrate treating system comprising: a substrate treating apparatus having one physical load port for receiving pods for storing substrates, and a carrier transport system for transporting the pods to and from the one physical load port, the control apparatus comprising: a virtual load port control device for allotting a plurality of virtual load ports to the one physical load port, and instructing the carrier transport system to perform a transporting operation to and from the plurality of virtual load ports on an assumption that the plurality of virtual load ports really exist. | ||
| 地址 | JP | ||