发明名称 FILM THICKNESS MEASURING APPARATUS AND FILM THICKNESS MEASURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a film thickness measuring apparatus and film thickness measuring method capable of measuring a wide range of film thickness at a high speed.SOLUTION: The present film thickness measuring apparatus applies pump light 71 and probe light 72 to each of a plurality of areas in a film to be measured. Each of the plurality of areas is vibrated by application of the pump light 71. The probe light 72 is applied to the plurality of areas vibrating respectively, so that reflected light according to the film thickness is generated at each of the plurality of areas. The reflected light at each of the plurality of areas is detected by a photo counter 35 and the film thickness at each of the plurality of ares is detected on the basis of the detection result.</p>
申请公布号 JP2014196942(A) 申请公布日期 2014.10.16
申请号 JP20130072335 申请日期 2013.03.29
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ISHII HARUYUKI;SASAZAWA HIDEAKI;TEZUKA HIDEKAZU;YOSHITAKE YASUHIRO;NAKAO TOSHIYUKI
分类号 G01B11/06 主分类号 G01B11/06
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